Roy Shiloh, Department of Physical Electronics, Fleischmann Faculty of Engineering, Tel Aviv University, Tel Aviv
A computer-generated hologram, measured with a FEI F20 TEM in the diffraction plane in LAD mode (910m) at 200kV. The scale bar was calculated as θ/ where θ= px 256 / 910, px 25 m , the pixel size 256 the length of the bar in pixels. The holographic mask, placed in the specimen holder, was fabricated using a focused ion-beam miller by drilling a two-dimensional array of ~60nm dips with a 100nm periodicity. The depth of each dip was carefully calculated using an iterative Fourier-transform algorithm
It is possible, under the appropriate conditions, to create such holograms in the diffraction plane of a STEM, for example, thus yielding a nanometer probe with a desired pattern
